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《3D打印-尼龍粉 制造工藝配方精選》
尼龍粉是一種常用于3D打印的熱塑性材料，具有高強度、耐磨性、耐化學腐蝕性以及良好的機械性能。它廣泛應(yīng)用于選擇性激光燒結(jié)（SLS）、多噴射熔融（MJF）等3D打印工藝。
3D打印尼龍粉的常見類型
尼龍11（PA11）：具有良好的抗紫外線和抗沖擊性能，適合戶外使用。
尼龍12（PA12）：強度和剛度更高，是SLS打印中最常用的材料之一。
復(fù)合尼龍材料：如玻璃纖維增強尼龍（如Nylon 12 GF Powder）和碳纖維增強尼龍（如Nylon 11 CF Powder），這些材料在強度和剛性上表現(xiàn)更優(yōu)。
3D打印尼龍粉的應(yīng)用領(lǐng)域
工業(yè)制造：用于制造機械零件、齒輪、軸承等，具有良好的耐磨性和機械強度。
汽車與航空航天：用于制造功能測試部件、發(fā)動機進氣歧管、輕量化結(jié)構(gòu)件等。
醫(yī)療領(lǐng)域：可用于制造生物相容性好的醫(yī)療器械。
消費品：如運動器材、鞋底模具等。
3D打印尼龍粉的優(yōu)勢
高精度與復(fù)雜結(jié)構(gòu)：SLS和MJF工藝可以實現(xiàn)復(fù)雜幾何形狀的打印，無需支撐結(jié)構(gòu)。
材料可重復(fù)使用：未燒結(jié)的尼龍粉末可以回收再利用，減少浪費。
良好的表面處理：尼龍粉末打印的部件表面可以進行噴砂、噴漆等后處理。
3D打印尼龍粉的局限性
吸濕性：尼龍材料容易吸收空氣中的水分，可能導致打印件變形或性能下降。
表面粗糙度：MJF打印的部件表面相對粗糙，需要額外的后處理。
材料選擇有限：與FDM等其他3D打印技術(shù)相比，SLS和MJF的材料種類相對較少。
總結(jié)
3D打印尼龍粉因其優(yōu)異的機械性能和廣泛的適用性，在工業(yè)制造、汽車、航空航天等領(lǐng)域具有重要的應(yīng)用價值。然而，其吸濕性和表面粗糙度等局限性也需要在實際應(yīng)用中加以注意。
極紫外光刻膠（EUV光刻膠）技術(shù)：EUV光刻膠是目前最先進的光刻膠技術(shù)之一，主要用于極紫外光刻工藝，能夠?qū)崿F(xiàn)極小的線寬和高分辨率的圖形轉(zhuǎn)移，是制造高端芯片的關(guān)鍵材料例如，JSR公司在2011年就與SEMATECH聯(lián)合開發(fā)出用于15nm工藝的化學放大型EUV光刻膠東京應(yīng)化（TOK）也在EUV光刻膠領(lǐng)域處于領(lǐng)先地位，其在2020年擁有EUV光刻膠51.8%的市占率。
高靈敏度和高分辨率光刻膠技術(shù)：通過優(yōu)化光刻膠的化學配方和結(jié)構(gòu)，提高光刻膠對光的靈敏度和分辨率，從而實現(xiàn)更小的圖形尺寸和更高的集成度如Inpria生產(chǎn)的包含氧化錫的EUV光刻膠，具有良好的靈敏度，將EUV的吸收效率提升了4倍，并且可以實現(xiàn)更簡單的制造流程和更大的工藝窗口。
多層膜光刻技術(shù)：為了進一步提高光刻分辨率，采用多層膜光刻技術(shù)，通過在光刻膠層之間增加特殊的膜層，減少光的反射和散射，提高光刻的對比度和分辨率。
本資料是收錄涉及《國際光刻膠制造工藝配方精選匯編》最新專利技術(shù)資料，資料中包括制造原料、配方、生產(chǎn)工藝、產(chǎn)品性能測試及標準、實際應(yīng)用效果，技術(shù)指標，解決的具體問題等等，是企業(yè)提高產(chǎn)品質(zhì)量和發(fā)展新產(chǎn)品的重要、實用、超值和難得的技術(shù)資料。
【資料內(nèi)容】制造工藝及配方
【資料語種】英文
【項目數(shù)量】56項
【電子版】1680元（PDF文檔 郵件發(fā)送）
目錄
| 序號 | 項目名稱 | 研制單位 |
| 1 | Enhanced Euv Materials, Photoresists And Methods Of Their Use | ROBINSON ALEX P G?[GB] JACKSON ED?[US] O'CALLAGHAN GREGORY?[GB] ROTH JOHN?[US] MCCLELLAND ALEXANDRA?[GB] LADA TOM?[US] POPESCU CARMEN?[GB] |
| 2 | Euv Lithography Using Polymer Crystal-Based Reticles | REKHI SANDEEP WALLING THOMAS JOHN FARRELL PICHUMANI PRADEEP SAILAM |
| 3 | Photoresist Composition For Euv, Method For Manufacturing Same, And Method For Forming Photoresist Pattern Using Same | HONG SUKWON?[KR] HWANG CHAN CUK?[KR] KIM DO WON?[KR] BYEON JIN HWAN?[KR] AHN JAE BOONG?[KR] |
| 4 | Pellicle For Euv Lithography And Method For Manufacturing Pillicle Film Of The Same | PARK CHUL KYUN HONG JU HEE CHOI MUN SU KIM DONG HOI |
| 5 | Pellicle For Euv Lithography | HONG JU-HEE?[KR] PARK CHUL-KYUN?[KR] CHOI MUN-SU?[KR] KIM DONG-HOI?[KR] |
| 6 | Method To Reduce Line Edge Roughness For Euv Photoresist Pattern | WANG XIN-KE?[CN] SHEN ZE-QING?[CN] SINGHA ROY SUSMIT?[IN] MALLICK ABHIJIT BASU?[US] BHUYAN BHASKAR JYOTI?[IN] TANG JIECONG?[SG] SUDIJONO JOHN?[US] SALY MARK?[US] |
| 7 | Enhanced Euv Photoresists And Methods Of Their Use | ROBINSON ALEX P G?[GB] JACKSON EDWARD?[US] ROTH JOHN?[US] LADA TOM?[US] O'CALLAGHAN GREG?[GB] |
| 8 | Organometallic Tin Clusters As Euv Photoresist | LU FENG?[US] |
| 9 | Euv Low Roughness Euv Lithography | WISE RICHARD SHAMMA NADER |
| 10 | Enhanced Euv Photoresist And Methods Of Use Thereof | ROBINSON ALEX P G JACKSON EDWARD ROTH JOHN LADA TOM O 'CALLAGHAN GREG |
| 11 | Pellicle For Euv Lithography | HONG JU HEE JUNG MIN WOOK CHOI MUN SU |
| 12 | Method Of Euv Lithography | CHEN TAI-YU?[TW] KHIVSARA SAGAR DEEPAK?[IN] CHIEN SHANG-CHIEH?[TW] LAM KAI TAK?[SG] YU SHENG-KANG?[TW] |
| 13 | Euv Composition For Semiconductor Euv Lithography And Method For Semiconductor Euv Lithography Using The Same | LEE GEUN SU?[KR] LEE YEONG SEON SEONG YEON HEE KIM SEOK HYUN KIM YOUNG CHAN CHEON JONG HYEON LEE SEUNG HYUK |
| 14 | Pellicle For Euv Lithography Masks And Methods Of Manufacturing Thereof | HSU PEI-CHENG?[TW] SUN TING-PI?[TW] LEE HSIN-CHANG?[TW] |
| 15 | Euv Metal Photoresist As Well As Preparation Method And Application Thereof | WANG SU FANG SHUNONG |
| 16 | Euv Photoresist As Well As Preparation Method And Application Thereof | WANG SU FANG SHUNONG |
| 17 | Euv/Eb Photoresist As Well As Preparation Method And Application Thereof | FANG SHUNONG WANG SU TANG CHEN |
| 18 | Euv Photomask And Manufacturing Method Of The Same | HSU FENG YUAN?[TW] SHEN TRAN-HUI?[TW] HSU CHING-HSIANG?[TW] |
| 19 | Euv Euv Dose Reducing Layers Related Structures And Methods And Systems For Their Manufacture | FATEMEH DAVODI PAUL CHATELAIN CHARLES DEZELAH |
| 20 | Method Of Forming Carbon-Based Spacers For Euv Photoresist Patterns | WANG XINKE SHEN ZEQING ROY SUMEET SINGH MALLIK ABHIJIT BASU BHUYAN BHASKAR JYOTI TANG JIECONG SUDIJONO JOHN SALY MARK |
| 21 | Zirconium-Coated Ultra-Thin, Ultra-Low Density Films For Euv Lithography | LIMA MARCIO D?[US] GRAHAM MARY VIOLA?[US] UEDA TAKAHIRO?[US] |
| 22 | Euv Membrane For Euv Lithography And Manufacturing Method For The Same | YU LAN SEO KYOUNG WON PARK JIN SU YANG SEONG JU HONG SEONG GYU LEE HWA CHOL KIM CHEONG KIM KYOUNG SOO YUN WOO HYUN CHO SANG JIN LEE DONG HOON LEE SO YOON PARK SEONG HWAN KIM YONG SU KANG HONG GU CHOI JAE HYUCK |
| 23 | Euv Euv An Euv Pellicle Frame And An Euv Pellicle Using It | HORIKOSHI JUN?[JP] |
| 24 | Pellicle For Euv Lithography | HONG JU HEE PARK CHUL KYUN CHOI MUN SU KIM DONG HOI |
| 25 | Euv The Manufacturing Method Of Pellicle For Euv Photomask Using Reinforeced Graphene Membrane | KIM YONG KI?[KR] |
| 26 | Euv The Manufacturing Method Of Pellicle For Protecting Euv Photomask Using Reinforeced Pad | KIM YONG KI?[KR] |
| 27 | Euv The Manufacturing Method Of Pellicle For Euv Photomask Using Reinforeced Graphene Membrane | KIM YONG KI?[KR] |
| 28 | Implant Into Euv Metal Oxide Photoresist Module To Reduce Euv Dose | PRASAD RAJESH?[US] LIN YUNG-CHEN?[US] HUANG ZHIYU?[US] WANG FENGLIN?[US] LANG CHI-I?[US] HWANG HOYUNG DAVID?[US] AREVALO EDWIN A?[US] SHIM KYUHA?[US] |
| 29 | Method Of Manufacturing Euv Photo Masks | LEE HSIN-CHANG?[TW] HSU PEI-CHENG?[TW] LIEN TA-CHENG?[TW] WANG TZU YI?[TW] |
| 30 | Blankmask And Photomask For Euv Lithography With Backside Conductive Layer | WOO MI KYUNG PARK MIN KYU YANG CHUL KYU |
| 31 | Euv Euvextreme Ultraviolet Mask And Method For Manufacturing The Same | JANG SUNG WOO LEE SUN PYO JUNG EUI HAN |
| 32 | Euv The Manufacturing Method Of Graphene Membrane Pellicle For Extreme Ultra Violet Lithography | KIM YONG KI?[KR] |
| 33 | Enhanced Euv Photoresist Including A Core Tris(4-Hydroxyphenyl)Methane Group And Having Improved Sensitivity (Photosensitivity), Resolution (Line Width Roughness), Or Both | ROBINSON ALEX P G?[GB] MCCLELLAND ALEXANDRA?[GB] O '' CALLAGHAN GREG?[GB] JACKSON ED?[US] NGUYEN VAN HUY?[GB] MELONI FERNANDA?[IT] |
| 34 | Phase Shift Blank Mask And Photomask For Euv Lithography | KIM YONG-DAE LEE JONG-HWA YANG CHUL KYU |
| 35 | Methods For Making Euv Patternable Hard Masks | WU CHENGHAO TIMOTHY WILLIAM WEIDMAN KATIE NARDI |
| 36 | Pellicle For An Euv Lithography Mask And A Method Of Manufacturing Thereof | CHAO TZU-ANG?[TW] CHENG CHAO-CHING?[TW] WANG HAN?[TW] |
| 37 | Pellicle For Euv Lithography | HONG JU HEE PARK CHUL KYUN CHOI MUN SU KIM DONG HOI |
| 38 | Reflective Mask Blank For Euv Lithography, Mask Blank For Euv Lithography, And Manufacturing Methods Thereof | AKAGI DAIJIRO?[JP] KAWAHARA HIROTOMO?[JP] UNO TOSHIYUKI?[JP] ISHIKAWA ICHIRO?[JP] SAKAKI KENICHI?[JP] |
| 39 | Thin Film For Euv Lithography Mask And Method Of Manufacturing Same | XU BEICHENG LI WEIHAO LI HUANLING LI XINCHANG LIN JINXIANG |
| 40 | Euv Light Generation System And Production Method Of Electronic Device | NISHIMURA YUICHI UENO YOSHIFUMI |
| 41 | Thin Film For Euv Lithography Mask And Method Of Manufacturing Same | SON JUNG-PIL XU BEICHENG LI XINCHANG |
| 42 | Euv Euv Euv Euv-Level Substrate Euv Mask Base Euv Mask And Method Of Manufacturing Same | JI MINGHUA DONG YUHU HUANG ZAOHONG |
| 43 | Euv Photomask And Manufacturing Method Thereof | XUE WENZHANG LIAN DACHENG LI XINCHANG |
| 44 | Pellicle For Euv Lithography With Cnt Film And Method For Forming Film Of The Same | CHOI MUN SU HONG JU HEE PARK CHUL KYUN KIM DONG HOI |
| 45 | Detection Method Of Euv Pellicle Status | LIU YEN-HAO?[TW] WANG SHAO-HUA?[TW] ZHANG ZHENG-HAO?[TW] LIN FAN-CHI?[TW] KUO CHUEH-CHI?[TW] CHEN LI-JUI?[TW] LIU HENG-HSIN?[TW] |
| 46 | Euv The Forming Method Of Graphene For Pellicle Membrane Of Extreme Ultra Violet Lithography | KIM YONG KI?[KR] |
| 47 | Euv The Forming Method Of Graphene Membrane To Have Capping Layer For Pellicle Of Extreme Ultra Violet Lithography | KIM YONG KI?[KR] |
| 48 | Euv Euv Reflection-Type Mask Blank For Euv Lithography Reflection-Type Mask For Euv Lithography And Manufacturing Methods Therefor | AKAGI DAIJIRO?[JP] KAWAHARA HIROTOMO?[JP] SASAKI KENICHI?[JP] ISHIKAWA ICHIRO?[JP] UNO TOSHIYUKI?[JP] |
| 49 | Extreme Ultraviolet Lithography Method And Euv Photomask | LEE CHIEN-MIN?[TW] CHEN YEN-LIANG?[TW] LIN SHY-JAY?[TW] CHEN LEE-FENG?[TW] TAI KUO LUN?[TW] |
| 50 | Phase Shift Blankmask And Photomask For Euv Lithography | PARK MIN-KWANG?[KR] PARK MIN-KYU?[KR] WOO MI-KYUNG?[KR] YANG CHUL-KYU?[KR] KIM YONG-DAE?[KR] |
| 51 | Blankmask For Euv Lithography With Absorbing Film, And Photomask Fabricated With The Same | PARK MIN-KYU?[KR] WOO MI-KYUNG?[KR] PARK MIN-KWANG?[KR] YANG CHUL-KYU?[KR] |
| 52 | Membrane For Euv Lithography | HOUWELING ZOMER SILVESTER?[NL] GHIASI KABIRI MAHNAZ?[NL] GIESBERS ADRIANUS JOHANNES MARIA?[NL] BERGERS LAMBERTUS IDRIS JOHANNES CATHARINA?[NL] |
| 53 | Preferential Infiltration In Lithographic Process Flow For Euv Car Resist | ALVA GABRIELA?[US] HAN ZHEN-XING?[CN] SACHAN MADHUR?[IN] LANG CHI-I?[US] ZHOU LIN?[CN] LIU LEQUN?[US] KAZEM NASRIN?[US] |
| 54 | Enhanced Ultra-Thin, Ultra-Low Density Films For Euv Lithography And Method Of Producing Thereof | LIMA MARCIO D?[US] UEDA TAKAHIRO?[US] |
| 55 | Pellicle For An Euv Lithography Mask And A Method Of Manufacturing Thereof | LIN YUN-YUE?[TW] |
| 56 | Methods And Related Systems For Depositing Euv Sensitive Films | PATEL KISHAN ASHOKBHAI?[IN] TOMCZAK YOANN?[FR] DEZELAH CHARLES?[US] ZYULKOV IVAN?[RU] DE ROEST DAVID KURT?[BE] GIVENS MICHAEL?[US] PIUMI DANIELE?[IT] |